Description
This sputtering target, identified by catalog number 91017-TA, is specifically designed for use with sputter coaters. It is constructed from Tantalum, a material known for its durability and effectiveness in thin film deposition processes. The target features a precise diameter of 57mm, ensuring compatibility with standard sputter coater systems. Manufactured by Electron Microscopy Sciences, this component is essential for achieving high-quality sample preparation in electron microscopy applications.
- Constructed from durable Tantalum.
- Features a 57mm diameter for broad compatibility.
- Designed for use in sputter coater systems.
- Manufactured by Electron Microscopy Sciences.
Enhance your sample preparation with this high-quality sputtering target.





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