Description
This sputtering target, identified by MPN 91015-CO, is manufactured by Electron Microscopy Sciences. It is designed for use in sputter coaters and features a Cobalt composition. The target has a diameter of 50.8 mm and a thickness of 0.1 mm, making it suitable for various electron microscopy applications requiring thin film deposition. It is supplied as an individual unit.
- Cobalt composition for sputtering applications.
- Precise diameter of 50.8 mm.
- Standard thickness of 0.1 mm.
- Manufactured by Electron Microscopy Sciences.
Enhance your electron microscopy research with this high-quality sputtering target.
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