Description
This sputtering target is designed for use in sputter coaters, providing a reliable source of gold and palladium alloy. It features a specific composition of 60% gold and 40% palladium, ensuring consistent performance for critical applications in electron microscopy and material science. The target is manufactured to precise specifications for optimal deposition and sample preparation.
- Gold/Palladium (60:40) alloy composition
- 42mm diameter for compatibility with various sputter coaters
- High-quality material for consistent sputtering performance
Enhance your sample preparation with this essential sputtering target.
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