Description
This Cu Annular Sputter Target from Electron Microscopy Sciences is designed for precision applications in electron microscopy. It features a specific outside diameter of 57 mm and an inside diameter of 40 mm, ensuring compatibility with standard sputtering equipment. Manufactured with high-quality copper (Cu), this target is built for durability and optimal performance in demanding laboratory environments.
- Precision-engineered Cu Annular Sputter Target
- Specific dimensions for reliable equipment fit
- Durable construction for consistent results
Explore the quality and reliability of Electron Microscopy Sciences products for your research needs.
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