Description
This sputtering target, identified by MPN 91016-TA, is manufactured by Electron Microscopy Sciences from Tantalum (Ta). It is designed for use in sputter coaters and features a standard diameter of 54mm. This target is a crucial component for applications requiring thin film deposition in electron microscopy and other scientific fields. It is supplied as an individual unit for direct integration into compatible equipment.
- Manufactured from high-quality Tantalum (Ta).
- Standard diameter of 54mm for broad compatibility.
- Designed for use in sputter coating applications.
Explore the quality and reliability of Electron Microscopy Sciences’ sputtering targets for your research needs.





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