Description
This iridium sputtering target, identified by MPN 91009-IR, is designed for use in electron microscopy applications. It features a precise 39mm diameter, ensuring compatibility with standard sputtering equipment. Manufactured by Electron Microscopy Sciences, this target is crafted from high-purity iridium, a material known for its excellent sputtering characteristics and durability in vacuum environments. It is an essential component for sample preparation in advanced microscopy techniques, providing a reliable and consistent thin film deposition.
- High-purity iridium material
- Precise 39mm diameter
- Designed for electron microscopy applications
Explore the quality and reliability of Electron Microscopy Sciences’ sputtering targets for your research needs.
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