Description
This Cu Annular Sputter Target from Electron Microscopy Sciences is designed for precision applications in electron microscopy. It features a specific outside diameter of 59 mm and an inside diameter of 33 mm, ensuring compatibility with standard equipment. Manufactured with high-quality copper, this target is built for durability and optimal performance in sputtering processes. Its precise dimensions facilitate consistent and reliable results in sample preparation and analysis.
- High-quality copper construction
- Precise outside diameter of 59 mm
- Precise inside diameter of 33 mm
- Designed for electron microscopy applications
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